Job Description and Requirements

Investigate and analyze the challenges and opportunities in the areas of geometry manipulation, and exact and fuzzy pattern matching for the lithography applications on resolution enhancement techniques (RET) and optical proximity correction (OPC).

Propose and implement solutions for these challenges and work with other groups within Synopsys. Candidate with knowledge on optical lithography, image processing, and optimization algorithms for large-

scale linear and nonlinear systems is a plus.

Requirements (combined) :

Master or Ph.D. in Electrical Engineering, Computer Engineering, or Computer Science is preferred. The individual should have at least 2 years of experience in development of complex software projects, is familiar with Python and C / C++ coding with a strong background in data structure and algorithms.

It is essential that the individual has a strong desire to learn and explore new technologies and can demonstrate good analysis and problem solving skills.

The exceptional candidate will have prior knowledge and experience in computational geometry, image processing, or EDA tool development