Job Description and Requirements
Job Title : Sr II AE C Mask Synthesis / OPC
Description : This job position of Mask Synthesis / OPC CAE is to drive the adoption of Synopsys OPC technologies by demonstrating improvements in the customer's design and manufacturing process.
The Mask Synthesis / OPC CAE is an expert in applications spanning semiconductor design to silicon implementation. Interaction with customers and internal development is required to develop and deploy manufacturing EDA tools through photomask generation.
In addition the MS CAE aids internal and external customers in the development of production flows using lithography and process extension / simulation tools for OPC, PSM, simulation based verification, and other reticle enhancement techniques (RET).
Communicates customer and market needs to R&D, develops integrated flow solutions for specific customer needs. The ideal candidate will be an experienced, versatile individual with a wide span of skills to successfully perform in this key position.
Requirements : Includes; >
5 years RET production experience, or >
5 years Semiconductor / Mask Design, or >
5 years Lithography wafer process, Mask / Etch Process Engineering. Excellent communication and organizational skills are required.
Experience with wafer lithography and other IC fabrication techniques is necessary, and the scripting experience with any language is optionally required.
OPC tool usage and rigorous photolithography simulation experiences is a plus.
Must have M.S. at least(Dr. degree is preferred) - Optics and Physics-related background, with programming experience, or Master degree in EE / CS and Semiconductor or Mask Design / Engineering Experience.